首页
产品
黄页
商标
征信
会员服务
注册
登录
全部
|
企业名
|
法人/股东/高管
|
品牌/产品
|
地址
|
经营范围
发明名称
METHOD FOR EVALUATING THE EFFECTS OF MULTIPLE EXPOSURE PROCESSES IN LITHOGRAPHY
摘要
申请公布号
EP1634122(A4)
申请公布日期
2009.02.11
申请号
EP20040752670
申请日期
2004.05.19
申请人
INTERNATIONAL BUSINESS MACHINES CORPORATION
发明人
FONSECA, CARLOS, A.;BUKOFSKY, SCOTT, J.;LAI, KAFAI
分类号
G03C5/00;G03F7/20;G03F9/00
主分类号
G03C5/00
代理机构
代理人
主权项
地址
您可能感兴趣的专利
METHOD FOR EFFECTIVE CULTURE AND PROLIFERATION OF ES CELL
REPRODUCING DEVICE AND REPRODUCING METHOD
INTERCONNECTION SYSTEM
SERVER AND GAME MACHINE
BATHROOM VANITY UNIT WITH WEIGHT MEASURING FUNCTION
STACKED TYPE GARBAGE BOX
PLASMA MELTING FURNACE AND PLASMA MELTING METHOD
PLATFORM GAP ADJUSTING DEVICE
NETWORK CONTROL APPARATUS, NETWORK SYSTEM, AND PROGRAM
WIRELESS DATA COMMUNICATION METHOD AND SYSTEM
COMMUNICATION RELAY DEVICE AND PACKET TYPE JUDGING METHOD
DOOR LOCK CONTROL SYSTEM
VEHICLE SECURITY DEVICE AND VEHICLE SECURITY SYSTEM
EVALUATION DEVICE OF HYDROGEN STORAGE MATERIAL AND EVALUATION METHOD USING IT
ELECTRIC GUN
APPARATUS AND SYSTEM FOR DETECTING OBJECT
STRUCTURE, METHOD FOR MANUFACTURING THE SAME, AND DEVICE USING THE STRUCTURE
METHOD AND DEVICE FOR MANUFACTURING PRINTED WIRING BOARD
CONDUCTIVE FILM
IMAGE PROCESSOR