LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD
摘要
<p>A lithographic apparatus includes an illumination system configured to condition a beam of radiation; a pattern support configured to hold a patterning device, the patterning device configured to pattern the beam of radiation to form a patterned beam of radiation; a substrate holder configured to hold a substrate, the substrate holder including a support surface in contact with the substrate; a projection system configured to project the patterned beam of radiation onto the substrate; and a cleaning system including a cleaning unit, the cleaning unit constructed and arranged to generate radicals on the support surface of the substrate holder to remove contamination therefrom.</p>
申请公布号
WO2009015838(A1)
申请公布日期
2009.02.05
申请号
WO2008EP06145
申请日期
2008.07.25
申请人
ASML NETHERLANDS B.V.;BLEEKER, ARNO, JAN;VAN MEER, ASCHWIN, LODEWIJK, HENDRICUS, JOHANNES
发明人
BLEEKER, ARNO, JAN;VAN MEER, ASCHWIN, LODEWIJK, HENDRICUS, JOHANNES