ABA TRIBLOCK COPOLYMER AND METHOD FOR PRODUCING THE SAME

摘要

Disclosed is a novel hydroxystyrene-based ABA triblock copolymer which is excellent in resolution, electrical insulation, thermal shock resistance, adhesion and the like. This hydroxystyrene-based ABA triblock copolymer is useful as a raw material for a photosensitive resin component that is suitable for interlayer insulating films or surface protective films for semiconductor devices. Also disclosed is a simple method for producing such a hydroxystyrene-based ABA triblock copolymer. Specifically disclosed is a novel hydroxystyrene-based ABA triblock copolymer which is composed of a segment A containing a hydroxystyrene repeating unit (a1) and a segment B containing a vinyl ether repeating unit (b). The linking portion between the segment A and the segment B has a specific structure. Also specifically disclosed is a method for producing such a hydroxystyrene-based ABA triblock copolymer. This copolymer can be produced by radically polymerizing a hydroxystyrene monomer, while using a polyvinyl ether having thiol groups at both ends as a chain-transfer agent.