发明名称 ALIGNER, DEVICE MANUFACTURING METHOD, AND CLEANING METHOD
摘要 <P>PROBLEM TO BE SOLVED: To provide an aligner capable of preventing deterioration in performance due to contamination. <P>SOLUTION: The aligner exposes a substrate to exposure light through first liquid. The aligner has a first collecting hole for collecting at least part of the first liquid during the exposure of the substrate and a second collecting hole for collecting second liquid supplied to come into contact with a predetermined member during cleaning of the predetermined member brought into contact with the first liquid, and performs the collecting operation of the second collecting hole during the cleaning while stopping the collecting operation of the first collecting hole. <P>COPYRIGHT: (C)2009,JPO&INPIT
申请公布号 JP2009016421(A) 申请公布日期 2009.01.22
申请号 JP20070173829 申请日期 2007.07.02
申请人 NIKON CORP 发明人 NAGASAKA HIROYUKI
分类号 H01L21/027;G03F7/20 主分类号 H01L21/027
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