| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide an immersion type exposure apparatus for reducing dryness of a final lens surface than conventional ones or eliminating it, when treatment is stopped during exposure treatment, as well as, in changing over of substrates, and reducing the adhesion of impurities to the final lens surface than conventional ones, or eliminating it even if the impurities are mixed in liquid. <P>SOLUTION: An exposure apparatus exposes a substrate via a liquid, filling between the final lens surface of a projection optical system closest to the substrate and the substrate, and it has a recessed liquid container that is provided at a place different from the substrate mounting place on a substrate stage, a liquid supply means for supplying the liquid to the container, and a liquid recovery means for recovering the liquid from the container. The exposure apparatus has the final lens surface immersed in the liquid in the container, when exposure to the substrate is not to be performed. <P>COPYRIGHT: (C)2009,JPO&INPIT |
