发明名称 THIN FILM TRANSISTOR, METHOD OF FABRICATING THE SAME, ORGANIC LIGHT EMITTING DIODE DISPLAY DEVICE INCLUDING THE SAME, AND METHOD OF FABRICATING THE SAME
摘要 PROBLEM TO BE SOLVED: To provide a thin film transistor, in which the semiconductor layer is crystallized using a metal catalyst, having a superior electric characteristic by controlling the concentration of a metal catalyst according to the position of the channel region in a semiconductor layer, and to provide a method of fabricating the same and an organic light emitting diode display device including the same. SOLUTION: The thin film transistor includes a substrate, the semiconductor layer crystallized using the metal catalyst, disposed on the substrate and including a channel region and source/drain regions, and a gate electrode disposed to correspond to a predetermined region of the semiconductor layer, a gate insulating film disposed between the gate electrode and the semiconductor layer to insulate the semiconductor layer from the gate electrode, and a source/drain electrode electrically connected to the source/drain region of the semiconductor layer, respectively. In the channel region of the semiconductor layer, the metal catalyst is present at a concentration of 6.5×E17 atoms/cm<SP>3</SP>or less within 150Åin the vertical direction from the surface of the semiconductor layer. COPYRIGHT: (C)2009,JPO&INPIT
申请公布号 JP2009010391(A) 申请公布日期 2009.01.15
申请号 JP20080169193 申请日期 2008.06.27
申请人 SAMSUNG SDI CO LTD 发明人 YANG TAE-HOON;PARK BYOUNG-KEON;SEO JIN-WOOK;LEE KI-YONG;LEE KIL-WON
分类号 H01L29/786;H01L21/20;H01L21/336;H01L51/50 主分类号 H01L29/786
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