发明名称 |
REFLECTIVE MASK BLANK FOR EXPOSURE, REFLECTIVE MASK FOR EXPOSURE, METHOD OF PRODUCING A SEMICONDUCTOR DEVICE, AND SUBSTRATE PROVIDED WITH MULTILAYER REFLECTIVE FILM |
摘要 |
To provide a reflective mask blank for exposure that can solve a problem of adsorption failure in fixing a reflective mask using an electrostatic chuck and thus can flatten the surface of the mask using the electrostatic chuck, thereby realizing high-accuracy pattern transfer. In a reflective mask blank for exposure having a multilayer reflective film formed on a board and adapted to reflect exposure light and an absorbent layer formed on the multilayer reflective film and adapted to absorb the exposure light, the shape of a surface of the mask blank on its side opposite to its transfer pattern forming surface is a shape having a convex surface.
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申请公布号 |
US2009017387(A1) |
申请公布日期 |
2009.01.15 |
申请号 |
US20070874446 |
申请日期 |
2007.10.18 |
申请人 |
HOYA CORPORATION |
发明人 |
SHOKI TSUTOMU |
分类号 |
B32B1/00;G03F1/22;G03F1/24;G03F1/60;G03F7/20;H01L21/027 |
主分类号 |
B32B1/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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