APPARATUS FOR SITTING A WAFER IN A RAPID THERMAL PROCESSING EQUIPMENT

摘要

The device for sitting wafer of the rapid thermal process apparatus is provided to block the scratch phenomenon and the pin mark phenomenon by using the support pin for spreading the load of wafer. The support pin(102) is formed in the bottom side to support the lower part of the wafer(w). The center part has three support pins, the middle part has three support pins and the edge part has six support pins. The angle of the support pins of the center and the middle part is 120° and the angle of the support pins of the edge part is 60°. The middle part corresponds 2/3r location of the wafer in the radial direction. The edge part corresponds 3 mm or less from the end of the wafer.