发明名称 FLASH MEMORY DEVICES INCLUDING MULTI-LAYER TUNNEL INSULATOR AND METHOD OF FABRICATING THE SAME
摘要 <p>The flash memory devices including multi-layer tunnel insulator and method of fabricating the same are provided to obtain the stable data retention characteristic by forming the multilayer turner insulating layer having various energy band gaps. The lower part tunnel insulating layer(131) is formed on the substrate(110). The top tunnel insulating layer(135) is formed on the lower part tunnel insulating layer. The P-type floating gate(140) is formed on the top tunnel insulating layer. The insulating layer(150) is formed on the P-type floating gate between the gate. The control gate(160) is formed on the insulating layer between the gate. The top tunnel insulating layer is the amorphous oxide film.</p>
申请公布号 KR20090003876(A) 申请公布日期 2009.01.12
申请号 KR20070067610 申请日期 2007.07.05
申请人 SAMSUNG ELECTRONICS CO., LTD. 发明人 BAEK, SUNG KWEON;HWANG, KI HYUN;NOH, JIN TAE;KOO, BON YOUNG;YANG, SANG RYOL
分类号 H01L27/115;H01L21/8247 主分类号 H01L27/115
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