| 摘要 |
<p>An exposure apparatus (EX) is provided with immersion systems (86, 87) and a replacing system (CS) for replacing an immersion member (70). The replacing system (CS) is provided with a holding apparatus (30) for removably holding the immersion member (70) and a transfer apparatus (50). Deterioration of the operation rate due to cleaning or replacement of the immersion member (70) is suppressed by using the replacement system (CS). ® KIPO & WIPO 2009</p> |
