发明名称 Back pressure control system for CMP and wafer polishing
摘要 A wafer carrier with a back pressure applicator system adapted to provide high resolution back pressure control. A plurality of millimeter scale distensible elements are disposed between the wafer carrier pressure plate and a process wafer, and selectively distended to provide excess backpressure to select small areas of a wafer known to exhibit resistance to removal vis-à-vis the surrounding wafer surface. Distensible elements may be in the form of expandable pneumatic chambers or electro-mechanical elements such as solenoids, shape memory elements, electrostatic plates, etc.
申请公布号 US7467990(B2) 申请公布日期 2008.12.23
申请号 US20060369700 申请日期 2006.03.06
申请人 STRASBAUGH 发明人 STRASBAUGH ALAN
分类号 B24B11/00;B24B37/04;B24B49/16 主分类号 B24B11/00
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