| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a material for forming a resist protective film for immersion lithography, for forming a protective film that has high water repellency against water or an immersion medium essentially comprising water, is easily peeled by a developer solution and does not cause mixing with a photoresist layer. <P>SOLUTION: A vinyl ether copolymer is disclosed, which has a vinyl ether structural unit expressed by general formula (1) (wherein Y represents an alkylene group, an alkyleneoxy group or an alkyleneoxyalkyl group, Z represents a 6-15C monocyclic or condensed polycyclic or crosslinked polycyclic alicyclic group which may have a substituent, and n represents 0 or 1) and a maleimide structural unit expressed by general formula (2) (wherein each of R<SP>13</SP>and R<SP>14</SP>independently represents a hydrogen atom, a 1-5C chain or cyclic hydrocarbon group, an entirely or partially fluorinated 1-5C chain or cyclic hydrocarbon group or a halogen atom). <P>COPYRIGHT: (C)2009,JPO&INPIT |
