发明名称 |
COMPOSITION FOR FORMING RESIST UNDERLAYER FILM, AND RESIST UNDERLAYER FILM |
摘要 |
A composition for forming a resist underlayer film of the present invention is capable of forming a resist underlayer film which has a good matching property with a resist, by including a siloxane polymer component having a repeating unit which contains a monovalent organic group containing a sulfur atom. Thus, the composition of the resist layer film capable of forming a resist underlayer film which has a good matching property with a resist is realized.
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申请公布号 |
US2008312400(A1) |
申请公布日期 |
2008.12.18 |
申请号 |
US20080137483 |
申请日期 |
2008.06.11 |
申请人 |
TOKYO OHKA KOGYO CO., LTD. |
发明人 |
YAMASHITA NAOKI;KAWANA DAISUKE;HARADA HISANOBU;YONEMURA KOJI |
分类号 |
G03F7/004;C08G77/04;C08G77/28 |
主分类号 |
G03F7/004 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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