| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a manufacturing method of a polishing pad the opening holes of which are roughly uniformly and roughly evenly formed, and restraining fluctuation between the polishing pads. <P>SOLUTION: This polishing pad is formed of an isocyanate group included compound as its main component by dry molding. The polishing pad is manufactured through: a preparation process to respectively prepare the isocyanate group included compound, dispersed liquid previously dispersing and diluting water in a polyole compound and a polyamine compound; a mixing process to mix each of the components and to prepare mixed liquid by blowing non-reactive gas in them; a mold pouring process to pour the mixed liquid into a mold; a hardening and molding process to mold a foaming body in the mold; a slicing process to form a plurality of the polishing pads by slicing the foaming body in a sheet shape; and a laminating process to stick the polishing pad and a double-sided tape on each other. A roughly even foam is formed by previously dispersing and diluting the water in the dispersed liquid, supplying the non-reactive gas and mixing them. <P>COPYRIGHT: (C)2009,JPO&INPIT |
