| 摘要 |
<p>The aligning device covers masks and substrate plates in the photolithographic prodn. of semiconductor components by the step and repeat process, accelerating the alignment, and making the different steps of the alignment process independent of each other. The substrate is held on a support permitting fine adjustment along the x and y axes, and rotation in the xy plane. The support is, in turn, mounted on a table with coarse adjustment in the x and y axes. The supports are linked for initial coarse adjustment and separated for the final fine adjustment.</p> |
