| 摘要 |
In the apparatus according to the parent Specification, for the production of Ge by the thermal decomposition of a gaseous Ge compound which apparatus comprises a heated support in a housing having a mouth closed by a heat screening plate and sealed by a base plate, the heat screening plate has at its side closer to the base plate a polished surface and at its side facing inwardly of the housing a rough surface. The surface of the base plate closer to the heat screening plate may be polished also.ALSO:In the apparatus according to the parent Specification for the production of Si by the thermal decomposition of a gaseous Si compound which apparatus comprises a heated support in a housing having a mouth closed by a heat-screening plate and sealed by a base-plate, the heat screening plate has at its side closer to the base-plate a polished surface and at its side facing inwardly of the housing a rough surface. The surface of the base-plate closer to the heat screening plate may be polished also. |
