| 摘要 |
<p>1,134,233. Ion pumps; gettering. L. D. HALL. 17 Jan., 1966 [25 Jan., 1965], No. 46388/67. Divided out of 1,134,231. Heading H1D. A sublimation target comprises a member 50 of a refractory metal, e.g. W, supporting a plurality of alternate layers 52, 54, 56 of reactive metal, e.g. Ti and layers 51, 53, 55, 57 of refractory metal, e.g. Mo, Ta or W. The target may be used in the sublimation pump described in Specification 1,134,232, or in the combined sputter and sublimation pump described in Specification 1,134,231.</p> |
