| 摘要 |
PURPOSE:To produce plasma in high concentration and homogeneity on a specimen to be etched for CVD deposition process at high speed and in high homogeneity by a method wherein a magnetic field in high homogeneity is formed in a hollow part inside a loop of loopy magnet or nearby region thereof. CONSTITUTION:A magnet is composed of a main magnet pole part 36 comprising a permanent magnet with N polarity in one half part and S polarity in the other half part as well as an auxiliary magnetic pole 40 made of ferromagnetic material having no coercive force. When a cathode 18 is impressed with electromagnetic wave of 13.56 MHz from an RF oscillator 24, a high-frequency AC electric field E is formed in the direction almost orthogonal to the surface of a substrate 20 toward the electrode 18 in the space above the electrode 18. The magnetron discharge 26 is formed by the electric field E and the magnetic field B. The plasma intensity in the discharge part 26 is proportional to the intensities of electric field E and magnetic field B to make the plasma intensity almost homogeneous. Through these procedures, the CVD deposition process can be performed at high speed and in high homogeneity.
|
