| 摘要 |
PURPOSE:To obtain a photosensitive layer having a uniform film thickness by selecting and mixing >=2 kinds from cyclic ether solvents and cyclic ketone solvents and adjusting the viscosity of a coating liquid to 250-500cps and the pulling up speed thereof to 30-80mm/min, then forming the photosensitive layer. CONSTITUTION:At least >=2 kinds selected from the cyclic ether systems and cyclic ketone systems are used by mixing the same as the org. solvent of the coating liquid 3 at the time of forming the photosensitive layer of a separated- function type on a base 1 by dip coating. For example, 1,4-dixane, tetrahydrofuran, etc., are used as the cyclic ether systems and, for example, cyclohexanone, cyclopentanone, etc., are used as the cyclic ketone systems. The photosensitive layer is formed by using such solvents and adjusting the viscosity of the coating liquid to 250-500cps and the pulling up speed from the coating liquid 3 to 30-80mm/min, by which the photosensitive layer having a uniform film thickness without having liquid sagging, etc., is obtd. |
