VORRICHTUNG ZUR ABLATIVEN PHOTODEKOMPOSITION VON ORGANISCHEN UND ANORGANISCHEN SUBSTANZEN, INSBES. ZAHNHARTSUBSTANZEN.

摘要

A device for ablative photodecomposition of organic and inorganic substances, in particular hard dental substances such as dentine or enamel, comprises an argon/fluoride excimer laser (193 nm) (20) and an application device (1) in the form of a focusing handpiece or handle (1) which brings the UV laser light to a spot-like focus at the point of impact. The laser light can thus be focused and reproduced with negligible loss. The excimer laser (20) is operated at an output pulse energy density of at least 50 mJ/cm<2> and a pulse rate less than 100 Hz. The laser light can be focused on an area of 1-2 mm or less, at an energy density per output pluse of at least 2500 mJ/mm<2>. The device also inlcudes an HeNe tunable laser (27) and a coupling mechanism (21). The handle (1) has a mirror and lens system (13, 7, 8, 26) optimized for reflection and transmission, respectively, of UV light at 193 nm. The handle (1) is hermetically sealed from the atmosphere and evacuated and is connected to the excimer laser (20) by an evacuated quartz tube (35).