| 摘要 |
<p>A method for providing a topography to the surface of a dental implant is provided to obtain a simple and direct method for providing high osseointegration for the surface of the ceramic of the dental implant. A method for providing a topography to the surface of a dental implant removes grain residual product or grain condensed materials from the ceramic materials by etching a part of the surface of the dental implant with an etching solution containing hydrofluoric acid at 70deg.C. The mean grain size of the ceramic material is in a range of 0.1-0.6 micrometer. The ceramic material is zirconia stabilized with yttrium oxide. Roughness is provided on the surface of the dental implant by sand blasting, milling and/or injection molding method before etching.</p> |
