| 摘要 |
<p>A stage apparatus, an exposure apparatus, and a device manufacturing method are provided to suppress deformation of articles held by a stage according to deformation of the stage generated from acceleration and deceleration of the stage. A stage apparatus having a stage moves the stage along a first direction. The stage apparatus includes a holding unit(208) fixed into the stage to be extended to the first direction. The holding unit includes a first part having a holding plane for holding articles and a second part inserted between the first part and the stage. A length of the second part in the first direction is less than that of the first part in the first direction.</p> |
