METHOD FOR MANUFACTURING PELLICLE AND PELLICLE

摘要

A method for manufacturing a pellicle and the pellicle are provided to obtain a thin pellicle having high strength by performing heat treatment at a temperature less than the glass transition temperature of a material for forming the pellicle film after peeling of the pellicle film from a substrate. A method for manufacturing a pellicle comprises the following steps of: peeling a pellicle film from a substrate on which the pellicle film is formed; and heating the pellicle film. The pellicle has a pellicle film made of fluorine resin and used for an exposure device for manufacturing a semiconductor or an exposure device for manufacturing a liquid crystal. A solution for dissolving resin constructing the pellicle film is dropped on a substrate having a flat surface to obtain a uniform liquid film. The liquid film is dried to form a film with only resin. A resin film is peeled from a substrate to form the pellicle film. The peeled pellicle film is adhered to an aluminum frame coated with adhesive and unnecessary film in both sides of the frame is cut and removed to complete the pellicle.