<p>A ClF<SUB>3 </SUB>gas generation system is provided with supply sources of chlorine ( 3 ) (for example a cylinder of compressed chlorine) and fluorine ( 4 ) (for example a fluorine generator) connected into a gas reaction chamber ( 2 ) enabling generation of ClF<SUB>3 </SUB>gas. The reaction chamber has a valved outlet (C) for the supply of the ClF<SUB>3 </SUB>gas to a process chamber for immediate local use.</p>
申请公布号
EP1084076(B1)
申请公布日期
2008.10.08
申请号
EP20000907809
申请日期
2000.03.06
申请人
SURFACE TECHNOLOGY SYSTEMS PLC
发明人
BHARDWAJ, JYOTI, KIRON;SHEPHERD, NICHOLAS;LEA, LESLIE, MICHAEL;HODGSON, GRAHAM