发明名称 MASK SET FOR MICROARRAY, MANUFACTURING METHOD FOR THE SAME, AND MANUFACTURING METHOD OF THE MICROARRAY USING THE MASK SET
摘要 PROBLEM TO BE SOLVED: To provide a mask set where the area of light projected region is controlled. SOLUTION: The mask set includes a plurality of masks for in-situ synthesis probes for microarrays. Each mask includes the light projected region and light-shielding region, the area of the light projected region is 5% or higher with respect to the total area of the light projected region and the light-shielding region. COPYRIGHT: (C)2008,JPO&INPIT
申请公布号 JP2008197107(A) 申请公布日期 2008.08.28
申请号 JP20080031798 申请日期 2008.02.13
申请人 SAMSUNG ELECTRONICS CO LTD 发明人 SHIN JAE-PIL;CHOI JIN-SOOK;YOO MOON-HYUN;LEE JONG-BAE
分类号 G01N33/53;C12M1/00;C12N15/09;G01N35/08;G01N37/00 主分类号 G01N33/53
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