发明名称 |
MASK SET FOR MICROARRAY, MANUFACTURING METHOD FOR THE SAME, AND MANUFACTURING METHOD OF THE MICROARRAY USING THE MASK SET |
摘要 |
PROBLEM TO BE SOLVED: To provide a mask set where the area of light projected region is controlled. SOLUTION: The mask set includes a plurality of masks for in-situ synthesis probes for microarrays. Each mask includes the light projected region and light-shielding region, the area of the light projected region is 5% or higher with respect to the total area of the light projected region and the light-shielding region. COPYRIGHT: (C)2008,JPO&INPIT |
申请公布号 |
JP2008197107(A) |
申请公布日期 |
2008.08.28 |
申请号 |
JP20080031798 |
申请日期 |
2008.02.13 |
申请人 |
SAMSUNG ELECTRONICS CO LTD |
发明人 |
SHIN JAE-PIL;CHOI JIN-SOOK;YOO MOON-HYUN;LEE JONG-BAE |
分类号 |
G01N33/53;C12M1/00;C12N15/09;G01N35/08;G01N37/00 |
主分类号 |
G01N33/53 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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