| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a liquid supply system which minimizes pressure variation and/or temperature change of liquid without causing unnecessary disturbance due to mechanical vibration, in a lithographic projection apparatus. <P>SOLUTION: Liquid is supplied from an inlet 21 to a reservoir 10 between a final element of a projection system PS and a substrate. An overflow removes the liquid above a given level. The overflow is constructed above the inlet, whereby the liquid is constantly replenished and the pressure in the liquid remains substantially constant. <P>COPYRIGHT: (C)2008,JPO&INPIT |
