| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a resist residue removing apparatus for the end face of a glass substrate which can completely remove a resist remaining on the peripheral end face of a glass substrate subjected to post-bake treatment after the formation of each color filter, and also to provide a manufacturing method of a color filter substrate using the apparatus. <P>SOLUTION: The resist residue removing apparatus 100 for the end face of a glass substrate comprises a low-voltage UV lamp 10, an elliptical reflecting mirror 20, and a light shielding plate 30. Ultraviolet rays emitted from the low-voltage UV lamp 10 are condensed at one point by the elliptical reflecting mirror 20 with a condensing height being nearly the same as the thickness of the glass substrate. <P>COPYRIGHT: (C)2008,JPO&INPIT |
