发明名称 |
TRANSPARENT SUBSTRATE WITH THIN FILM AND METHOD FOR MANUFACTURING TRANSPARENT SUBSTRATE WITH CIRCUIT PATTERN WHEREIN SUCH TRANSPARENT SUBSTRATE WITH THIN FILM IS USED |
摘要 |
An object of the invention is to provide a method for manufacturing a transparent substrate provided with a tin oxide thin film which can be satisfactorily patterned even by irradiation with a laser light having low energy because an ablation phenomenon occurs therewith. The invention relates to a method for manufacturing a transparent substrate bearing a circuit pattern, which comprises irradiating a thin-film-attached transparent substrate comprising a transparent substrate having thereon a transparent conductive film having a carrier concentration of 5x10<SUP>19</SUP>/cm<SUP>3 </SUP>or higher, with a laser light having a wavelength of 1,064 nm to form a circuit pattern on the transparent substrate.
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申请公布号 |
US2008202798(A1) |
申请公布日期 |
2008.08.28 |
申请号 |
US20080110707 |
申请日期 |
2008.04.28 |
申请人 |
ASAHI GLASS COMPANY LIMITED |
发明人 |
SATOH RYOHEI;NAKAGAWA KOJI;MORINAGA EIJI;USUI REO;ISONO TAKAMITSU;TANAKA KENJI;TAKAKI SATORU;EBATA KENICHI;SAKAMOTO HIROSHI |
分类号 |
H05K1/03;H01B5/14;H01B13/00;H01J11/10;H01J11/22;H05K3/22 |
主分类号 |
H05K1/03 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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