发明名称 TRANSPARENT SUBSTRATE WITH THIN FILM AND METHOD FOR MANUFACTURING TRANSPARENT SUBSTRATE WITH CIRCUIT PATTERN WHEREIN SUCH TRANSPARENT SUBSTRATE WITH THIN FILM IS USED
摘要 An object of the invention is to provide a method for manufacturing a transparent substrate provided with a tin oxide thin film which can be satisfactorily patterned even by irradiation with a laser light having low energy because an ablation phenomenon occurs therewith. The invention relates to a method for manufacturing a transparent substrate bearing a circuit pattern, which comprises irradiating a thin-film-attached transparent substrate comprising a transparent substrate having thereon a transparent conductive film having a carrier concentration of 5x10<SUP>19</SUP>/cm<SUP>3 </SUP>or higher, with a laser light having a wavelength of 1,064 nm to form a circuit pattern on the transparent substrate.
申请公布号 US2008202798(A1) 申请公布日期 2008.08.28
申请号 US20080110707 申请日期 2008.04.28
申请人 ASAHI GLASS COMPANY LIMITED 发明人 SATOH RYOHEI;NAKAGAWA KOJI;MORINAGA EIJI;USUI REO;ISONO TAKAMITSU;TANAKA KENJI;TAKAKI SATORU;EBATA KENICHI;SAKAMOTO HIROSHI
分类号 H05K1/03;H01B5/14;H01B13/00;H01J11/10;H01J11/22;H05K3/22 主分类号 H05K1/03
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