摘要 |
<p>An optical lithography device and a manufacturing method of an optical head thereof are provided. The optical lithography device includes a collimated light- supplying unit, which provides collimated light, an optical head, which divides the collimated light toward a plurality of regions, selectively allows the divided lights to pass through the respective regions, and condenses the lights passing through the respective regions, and a substrate-driving unit, which drives a substrate to be patterned by the lights irradiated from the optical head. The optical lithography device can be miniaturized thanks to the simplification of the structure thereof, the manufacturing cost is reduced, and the alignment error of the optical axis of the microlens array is minimized.</p> |
申请人 |
INDUSTRY-ACADEMIC COOPERATION FOUNDATION, YONSEI UNIVERSITY;KANG, SHINILL;LIM, JI SEOK |
发明人 |
KANG, SHINILL;LIM, JI SEOK |