发明名称 |
PLUME MEASUREMENT METHOD, PLUME EVALUATION METHOD, LASER ABLATION METHOD, AND LASER ABLATION APPARATUS |
摘要 |
PROBLEM TO BE SOLVED: To provide a plume measurement method, a plume evaluation method, a laser ablation method, and a laser ablation apparatus for depositing a thin film having consistent crystallinity or consistent characteristic with excellent reproducibility by laser ablation. SOLUTION: When a target material is instantaneously evaporated by irradiating a target 2 in a chamber 1 with pulse laser beams 4, and a thin film of an evaporation material is deposited on a substrate 3 facing the target, the size and the shape of the plume 5 generated when irradiating the target 2 with the laser beams 4 are acquired in a matrix form as digital information of the light intensity. COPYRIGHT: (C)2006,JPO&NCIPI
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申请公布号 |
JP2006117986(A) |
申请公布日期 |
2006.05.11 |
申请号 |
JP20040305771 |
申请日期 |
2004.10.20 |
申请人 |
FUJITSU LTD;INTERNATL SUPERCONDUCTIVITY TECHNOLOGY CENTER |
发明人 |
NAMIGASHIRA TSUNEHIRO;ADACHI SEIJI;WAKANA HIRONORI;ISHIMARU YOSHIYASU;TANABE KEIICHI |
分类号 |
C23C14/28;H01L39/24 |
主分类号 |
C23C14/28 |
代理机构 |
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代理人 |
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地址 |
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