| 摘要 |
<p>The present invention relates to producing ultra flat micro surfaces suitable, for instance, for micro-mirrors which meet the requirements of diffractive mode operation. In particular, it relates to low pressure chemical mechanical planarization (CMP) of a partially cured sacrificial layer. The method of producing an ultra-flat surface overlying a sacrificial substrate, the sacrificial substrate including a polyimide thin film, includes: thermal partial imidization of a polyamic acid film, wherein at least a portion but not all of the polyamic acid film has been imidized into polymide; chemical mechanical polishing of the partially imidized film; and thermal final imidization of the polished partially iminized film.</p> |
