发明名称 NEGATIVE PHOTOSENSITIVE RESIN COMPOSITION AND NEGATIVE PHOTOSENSITIVE ELEMENT
摘要 <p>A negative photosensitive resin composition that can be formed into projections for control of liquid crystal alignment capable of realizing precision higher than that attained by the use of positive photosensitive resin compositions; and a photosensitive element produced from the above negative photosensitive resin composition, which can be employed in a transfer method (laminate system) and can be easily stored to thereby enable use without wasting, excelling in film thickness stability. In particular, a negative photosensitive resin composition comprising an alkali soluble resin (a), a reactive monomer (b) and a photoreaction initiator (c) characterized in that 50% or more of the total mass of mixed reactive monomer (b) is occupied by a monofunctional reactive monomer; and a negative photosensitive element comprising a support and, superimposed thereon, a negative photosensitive resin composition layer consisting of the above negative photosensitive resin composition.</p>
申请公布号 KR20060041233(A) 申请公布日期 2006.05.11
申请号 KR20067000899 申请日期 2006.01.13
申请人 HITACHI CHEMICAL COMPANY, LTD. 发明人 YAMADA NAOKI;SAITOU MANABU;TANAKA HIROYUKI;YAMAZAKI HIROSHI
分类号 G03F7/027;G02F1/1333;G03F7/004 主分类号 G03F7/027
代理机构 代理人
主权项
地址