| 摘要 |
PROBLEM TO BE SOLVED: To make coverage and padding characteristics to a fine pattern good as compared with a conventional art in a method of depositing to the fine pattern using the medium of a super-critical state and further to enable to deposit to the still more fine pattern. SOLUTION: A method of supplying and depositing treatment medium which dissolves a precursor in the medium of the super-critical state, depositing on the substrate to be processed, includes a first step of setting the temperature of the substrate to be processed to the first temperature which is under the depositing minimum temperature that is the minimum of exhibiting temperature and supplying the treatment medium on the substrate to be processed; and a second step of depositing on the substrate to be processed by raising the first temperature of the substrate to be processed from the temperature of the substrate to be processed to the second temperature which is more than the above depositing minimum temperature. COPYRIGHT: (C)2006,JPO&NCIPI
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