发明名称 |
SUBSTRATE HEAT TREATMENT APPARATUS AND SUBSTRATE TRANSFER TRAY USED IN SUBSTRATE HEAT TREATMENT |
摘要 |
[PROBLEMS] To provide a substrate heat treatment apparatus which can suppress generation of a rough surface of a substrate to which heat treatment is performed. [MEANS FOR SOLVING PROBLEMS] The substrate heat treatment apparatus is provided with a heating means for performing heat treatment to a substrate arranged in a treatment chamber which can be evacuated, and the apparatus performs heat treatment to the substrate arranged in the treatment chamber by the heating means. A susceptor is arranged between the heating means and the substrate, and a susceptor surface on a side whereupon the substrate is arranged is covered with a member which does not discharge a gas while the substrate heat treatment is performed. A heat receiving body for receiving heat from the heating means through the susceptor is arranged on a side which faces the susceptor by having the substrate in between, and a surface of the heat receiving body on the side whereupon the substrate is arranged is covered with a member which does not discharge a gas while the substrate heat treatment is performed. |
申请公布号 |
WO2006043530(A1) |
申请公布日期 |
2006.04.27 |
申请号 |
WO2005JP19090 |
申请日期 |
2005.10.18 |
申请人 |
CANON ANELVA CORPORATION;SHIBAGAKI, MASAMI;KUREMATSU, YASUMI |
发明人 |
SHIBAGAKI, MASAMI;KUREMATSU, YASUMI |
分类号 |
H01L21/324;H01L21/26;H01L21/673 |
主分类号 |
H01L21/324 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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