SOURCE HEAD ARC CHAMBER OF ION INJECTION APPARATUS

摘要

A source head arc chamber of an ion implantation apparatus is provided to prevent a breaking effect of a filament and to lengthen a lifetime of the filament by using a heater. A chamber(110) is used for receiving and storing gas. A filament(120) is installed in the chamber. A heater(130) is formed to generate thermal electrons by heating the filament. A power supply unit(140) supplies power to the heater to operate the heater. A reflector(150) is formed to reflect the thermal electrons of the filament. The filament is connected to the heater through a heating bar. The reflector has a dual type reflector structure which is disposed opposite to each other. A dual gas supply line is installed in the chamber.