| 摘要 |
<p>A method for repairing defects on an exposure mask is provided to repair the defected exposure mask by laying a DFPR(Dry Film Photoresist) on the defected part of the exposure mask and hardening the DFPR pattern through thermal processing. A method for repairing defects on an exposure mask includes the steps of: examining the exposure mask to find a defected pattern(230); attaching DFPR(Dry Film Photoresist) onto the defected pattern; subjecting the DFPR to exposure and development processes to repair the defect pattern; carrying out a thermal processing about a repaired DFPR pattern(270) to harden the DFPR pattern. The defect pattern of the exposure mask is displayed through coordinate value.</p> |
