DEVICE MANUFACTURING METHOD, COMPUTER PROGRAM PRODUCT, AND LITHOGRAPHIC APPARATUS

摘要

PROBLEM TO BE SOLVED: To provide an improved method for correcting phase variations in optical projection lithography.

SOLUTION: Disclosed is a method of optimizing the adjustable settings of a projection system in a lithographic apparatus that includes the steps of: determining an object spectrum and a pupil filling function for a device pattern and an illumination mechanism; determining a symmetry of the object spectrum; building up a merit function for a wave-front in a pupil plane of the projection system with the settings of the adjustable elements as variables with reference to the symmetry; and optimizing the merit function.

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