METHOD FOR MANUFACTURING ANION EXCHANGE RESIN, ANION EXCHANGE, MIXED BED RESIN AND METHOD FOR MANUFACTURING ULTRAPURE WATER FOR CLEANING ELECTRIC APPLIANCE/MATERIAL

摘要

PROBLEM TO BE SOLVED: To provide an anion exchange resin which develops little eluate and hardly deteriorates the even degree of the surface of a silicon wafer.

SOLUTION: The method for manufacturing the anion exchange resin includes the process of contacting a water-soluble polymer containing an anionic dissociation group, while the amount of contact of the water-soluble polymer is 0.01-10 mmol/L as the amount of the anionic dissociation group of the water-soluble to the anion exchange of 1 litter, and the even degree Rms of the surface of the wafer is 4 Å or less which is requested by a silicon wafer test for the obtained anion exchange resin.

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