| 摘要 |
<P>PROBLEM TO BE SOLVED: To suppress the generation of particle because of the nonuniformity of damage, being capable of eliminating the nonuniformity of the damage of a processing tank wall by Faraday shield. <P>SOLUTION: The plasma processing apparatus includes a processing tank 10 provided for plasma processing, an inductive coil 31 which applies an inductive electric field for plasma generation in the processing tank 10, a processing tank wall 15 of which the processing tank portion facing opposedly the inductive coil 31 is composed of dielectric, a Faraday shield 41, being movably installed between the inductive coil 31 and the processing tank wall 15 and having an opening in a part, and a drive mechanism to move the Faraday shield 41. <P>COPYRIGHT: (C)2009,JPO&INPIT |
