发明名称 PROCESS FOR FABRICATING FUNCTIONAL ELEMENT, PHOTOELECTRIC CONVERSION ELEMENT, IMAGE SENSOR
摘要 <p><P>PROBLEM TO BE SOLVED: To provide a process for fabricating a functional element in which deterioration in characteristics of the whole functional element can be prevented while enhancing the characteristics of the functional film in the functional element. <P>SOLUTION: The process for fabricating a photoelectric conversion element having a pair of opposing electrodes 7 and 9, and a photoelectric conversion film 8 sandwiched between the electrodes 7 and 9 comprises a step for forming the photoelectric conversion film 8 above the electrode 7, a step for forming a deterioration prevention film 11 which prevents deterioration of the photoelectric conversion film 8 due to annealing for enhancing the characteristics of the photoelectric conversion film 8 on the photoelectric conversion film 8 (fig.2(a)), an annealing step to be performed after formation of the deterioration prevention film 11, a step for removing the deterioration prevention film 11 after the annealing step (fig.2(b)), and a step for forming the electrode 9 on the photoelectric conversion film 8 after removing the deterioration prevention film 11 (fig.2(c)). <P>COPYRIGHT: (C)2009,JPO&INPIT</p>
申请公布号 JP2008288253(A) 申请公布日期 2008.11.27
申请号 JP20070129114 申请日期 2007.05.15
申请人 FUJIFILM CORP 发明人 HAYASHI MASAYUKI
分类号 H01L51/40;H01L27/146;H01L31/10;H01L51/42 主分类号 H01L51/40
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