| 摘要 |
<p>A mask providing a local modified illumination and a method of manufacture thereof is provided to improve DOF property according to a pattern as an incident angle which is income in a localized region is diffracted with a diffraction pattern. A mask(100) providing the local modified illumination comprises a transparent mask substrate(101), a first mask pattern(102), a second mask pattern(103), a diffraction pattern(150). The first mask patterns are formed into a first pattern pitch(P1) on the first area(110) of the front side of the mask substrate. The second mask patterns are formed into a second pattern pitch(P2) on the second part(120) of the mask substrate. The diffraction pattern is formed on the backplane of the mask substrate of the second part opposite side. The diffraction pattern changes the pathway of the light differently with the first area as the exposure light which is income to the second part of the mask substrate is selectively diffracted.</p> |
