METHOD FOR FORMING STRUCTURE ON RESIST MATERIAL, AND ELECTRON BEAM EXPOSURE APPARATUS USED FOR THE METHOD

摘要

PROBLEM TO BE SOLVED: To provide a method for forming structures on a resist material by which the structures can be formed without restriction concerning a structure direction or edge roughness, and an apparatus.

SOLUTION: The method for forming the structures includes a step of determining locations on a substrate surface where the resist material is set according to predetermined angles α, β of the structures 231 to 234 to be formed, and setting the determined locations. Thus, the structures of arbitrary angles different from an integral multiple of 45°, for reference coordinates 101, 102 can be formed, and patterns of arbitrary angles with desired edge roughness can be drawn in a short period of time.

COPYRIGHT: (C)2009,JPO&INPIT