| 发明名称 |
TWO-DIMENSIONAL ARRAYS OF HOLES WITH SUB-LITHOGRAPHIC DIAMETERS FORMED BY BLOCK COPOLYMER SELF-ASSEMBLY |
| 摘要 |
Methods for fabricating sublithographic, nanoscale microstructures in two-dimensional square and rectangular arrays utilizing self-assembling block copolymers, and films and devices formed from these methods are provided. |
| 申请公布号 |
WO2008091741(A3) |
申请公布日期 |
2008.12.11 |
| 申请号 |
WO2008US50751 |
申请日期 |
2008.01.10 |
| 申请人 |
MICRON TECHNOLOGY, INC.;MILLWARD, DAN, B. |
发明人 |
MILLWARD, DAN, B. |
| 分类号 |
B81C1/00 |
主分类号 |
B81C1/00 |
| 代理机构 |
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代理人 |
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