HORIZONTAL DIFFUSION FURNACE FOR MANUFACTURING SEMICONDUCTOR WAFER

摘要

The horizontal diffusion furnace for fabricating semiconductor wafer is provided to facilitate the loading of the silicon wafer in the boat by using a boat having a cover in the thermal oxidation process of the semiconductor wafer. The horizontal diffusion furnace for fabricating semiconductor wafer comprises the reaction chamber(11), the boat(15), the support stand, the carriage(19), the gas injector(17), the gas inlet pipe(13). The reaction chamber has the heating coil(12). The boat has the cover(152) for opening and closing. One or more wafer(16) can be loaded on the boat. The support stand supports the boat. The carriage is combined with the one-side part of the support stand. The carriage moves the boat supported by the support stand to the reaction chamber. The gas injector is formed in the one-side part of the support stand. The gas injector injects the gas into the boat in which wafer is loaded. The gas inlet pipe is formed in the longitudinal direction of the support stand to supply the gas injected through the gas injector to the boat.