发明名称 Vertical image sensors and methods of fabricating the same
摘要 A vertical CMOS image sensor includes a plurality of photodiodes formed vertically in a substrate to a first depth. The vertical CMOS image sensor further includes a plurality of signal processing devices formed to correspond to the plurality of photodiodes. The plurality of signal processing devices are formed to transmit signals generated from the plurality of photodiodes. Each of the signal processing devices is substantially formed on the same plane with a corresponding one of the plurality of photodiodes.
申请公布号 US2008296475(A1) 申请公布日期 2008.12.04
申请号 US20070005369 申请日期 2007.12.27
申请人 SAMSUNG ELECTRONICS CO., LTD 发明人 KIM TAEK
分类号 H01L27/00;H01L31/00 主分类号 H01L27/00
代理机构 代理人
主权项
地址