发明名称 METHOD OF MAKING THIN FILM TRANSISTORS COMPRISING ZINC-OXIDE-BASED SEMICONDUCTOR MATERIALS
摘要 A method of making a thin film transistor comprising a zinc-oxide-containing semiconductor material and spaced apart first and second electrodes in contact with the material. The co-generation of high quality zinc oxide semiconductor films and contact electrodes is obtained, at low temperatures, using non-vacuum conditions, silver nanoparticles are deposited to form the source and drain and, upon heating, converted to conducting metal. Such an in-situ formation of the silver metal/zinc oxide interface provides superior transistor activity compared to evaporated silver.
申请公布号 US2008296567(A1) 申请公布日期 2008.12.04
申请号 US20070757549 申请日期 2007.06.04
申请人 IRVING LYN M;LEVY DAVID H;CHILDS ANDREA C 发明人 IRVING LYN M.;LEVY DAVID H.;CHILDS ANDREA C.
分类号 H01L29/22;H01L21/34 主分类号 H01L29/22
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