| 摘要 |
PROBLEM TO BE SOLVED: To provide a technique which can check a specific resistance value by using the optimum threshold value according to the kind of chemical liquid and make suitable the completion of rinsing in a substrate cleaning apparatus of one-bath system. SOLUTION: In the substrate cleaning apparatus of the present invention, a threshold value used for checking a specific resistance value during rinsing can be set for each step on a recipe setting screen 42a. Thus by setting each threshold value according to the kind of chemical liquid used immediately before rinsing, a specific resistance value can be checked using the optimum threshold value during rinsing in each step. Further, it is possible to properly complete rinsing in each step. COPYRIGHT: (C)2009,JPO&INPIT
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