| 摘要 |
PROBLEM TO BE SOLVED: To provide an etchant for conductive film which has superior etching characteristics and with which a conductive film pattern of high fineness precision having stable conductivity is formed, and a manufacturing method of the conductive film pattern. SOLUTION: The etchant for conductive film contains at least an etching agent for conductive film, containing secondary cerium ammonium nitride, and a surface active agent in water, the surface active agent being a mixture (W) of 60 to 82 mass% of perfluoroalkyl sulfonate having a straight-chain fluorocarbon group and 18 to 40 mass% of perfluoroalkyl sulfonate having a branch-chain fluorocarbon group. The manufacturing method of the conductive film pattern uses the etchant for conductive film. COPYRIGHT: (C)2009,JPO&INPIT
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