发明名称 PLASMA PROCESSOR AND PLASMA PROCESSING METHOD
摘要 PROBLEM TO BE SOLVED: To provide a plasma processor and a plasma processing method, wherein Na generation is reduced when quartz glass, etc., are used as a dielectric component. SOLUTION: The plasma processor has: the dielectric component containing an impurity element which becomes a positive ion and a movable ion; a vacuum container partially sealed by use of the dielectric component; a means for leading a gas into the vacuum container to adjust an internal pressure of the vacuum container; a means for radiating an electromagnetic wave into the vacuum container via the dielectric component; and a means for holding a processing body. The plasma processor generates a plasma in the vacuum container and processes the processing body by use of the plasma. An electrode is arranged on the opposite side of a face coming into contact with the plasma of the dielectric component, and a more negative DC potential than a floating potential of the face where the dielectric component comes into contact with the plasma is applied to the electrode, thereby reducing the generation of Na. COPYRIGHT: (C)2009,JPO&INPIT
申请公布号 JP2008288348(A) 申请公布日期 2008.11.27
申请号 JP20070131088 申请日期 2007.05.16
申请人 CANON INC 发明人 KITAGAWA HIDEO;FUKUCHI YUSUKE
分类号 H01L21/31;H01L21/283;H01L21/316;H01L21/318;H01L21/768;H01L29/78 主分类号 H01L21/31
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