| 摘要 |
A multi-mode plasma generating method and the apparatus are provided to obtain the critical dimension and the desired etch profile by controlling the plasma density distribution. The plasma generating method in the plasma chamber having plasma source coils(131,132,133) on the top includes the step for defining the upper side of the plasma chamber into a plurality of domains; the step for controlling the frequency generated from the plasma source coil portion and the plasma source coil portion corresponding to the segmented each domain according to the desired etch profile; the step for forming the variable capacitor on the plasma source coil portion; the step for adjusting the capacitance of the variable capacitor.
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